ECCV 2026Poster

Layout-Conditioned Autoregressive Text-to-Image Generation via Structured Masking

作者: Zirui Zheng, Takashi Isobe, Tong Shen, Xu Jia, Xiaomin Li, Jianbin Zhao, mengmeng Ge, Baolu Li, Qinghe Wang, Haiwen Diao, Dong Li, Yunzhi Zhuge, Dong Zhou, Huchuan Lu, Emad Barsoum

摘要

Although autoregressive (AR) models have demonstrated re-markable success in image generation, extending these models to layout-conditioned generation remains challenging due to the sparse natureof layout conditions and the risk of feature entanglement. We presentStructured Masking for AR-based Layout-to-Image (SMARLI), a novelframework that effectively integrates spatial layout constraints into theAR generation process. To equip AR models with layout control, a struc-tured masking strategy is applied to the attention computation to governthe interaction among the global prompt, layout, and image tokens. Thisdesign prevents the misassociation of different regions with their corre-sponding descriptions while enabling the sufficient injection of layoutconstraints into the generation process. To alleviate the exposure bias ofAR models and further enhance generation quality and layout accuracy,we incorporate a Group Relative Policy Optimization (GRPO) post-training scheme. We adapt it to the next-set-based paradigm and intro-duce a specifically designed layout reward, which is coordinated with animage quality reward to guide policy optimization in a balanced manner.Experimental results demonstrate that SMARLI seamlessly integrateslayout tokens with text and image tokens without compromising genera-tion quality, and the proposed masking strategy and post-training schemecan also be transferred to standard next-token-based AR models. Theproposed framework achieves superior layout control while maintainingthe structural simplicity and generation efficiency of AR models.

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